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    RHEINISCH-WESTFLISCHETECHNISCHE

    HOCHSCHULEAACHEN

    U:\PC_WNDWS\VORLAGEN\LLT_1.pot

    Laser Applications R&D at FraunhoferInstitute for Laser Technology

    Jens Gottmann, Claudia Hartmann, Alexander Horn,Leonid Moiseev, Lena Trippe

    Fraunhofer Institut fr Lasertechnik &

    Lehrstuhl fr Lasertechnik

    der RWTH-AachenSteinbachstrasse 15

    52074 Aachen

    Germany

    [email protected]

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Outline

    The Fraunhofer Institute for Laser Technology

    Related Results & Planned Experiments at JLAB FEL

    Micro-ablation with tailored pulse trains Drilling with s-laser radiation

    PLD

    Conclusion

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Tailored Optical Energy

    Manufacturing

    - Processes

    - System technology

    Microelectronics (EUV)

    Life science

    - Biophotonics

    - Biocompatible

    Materials

    Atomic and molecular

    Lasers

    Power/ Energy

    Quality

    - space (focusability)

    - time (pulse durationand formation)

    - spectral (wavelength,

    Laser types)

    1 m

    20 cm

    150 nm

    Application

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Vertical Structure: Car body welding with a high power DPSSL

    High-powerdiode-laser chips andpackaging Lifetime

    Systems design:high efficiency and

    beam quality

    Dr.Ing. H.c. F.Porsche AG

    Weldingprocess andmaterialsscience

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Organisation of Fraunhofer-ILT and of LLT RWTH Aachen University

    Plasma and X-Ray

    LLTDr. E. W. Kreutz

    Dr. J. Gottmann

    Prof. Dr. R. PopraweVice Director

    Administration

    ILTDr. P. Loosen

    B. Grossmann

    Beam Sources Laser Applications

    Integrated Optics

    Beam Sources

    Metrology andSurface Analysis

    Laser ComponentsDr. K. Boucke

    Solid State/Diode LasersD. Hoffmann

    MetrologyDr. R. Noll

    Plasma TechnologyDr. W. Neff

    CLT PlymouthDr. S. Heinemann

    CLFA ParisDr. W. Knapp

    Joining and CuttingDr. D. Petring

    Surface TechnologyDr. K. Wissenbach

    Micro TechnologyDr. A. Gillner

    System IntegrationDr. S. Kaierle

    Surface Technology

    Micro StructuringThin Film Technology

    System Integration

    Modelling and Simulation Dr. W. Schulz

    Marketing andCommunication

    A. Bauer

    Quality ManagementDr. A. DrenkerM. Talkenberg

    IT-ManagementDr. B. Weikl

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    RHEINISCH-WESTFLISCHETECHNISCHE

    HOCHSCHULEAACHEN

    U:\PC_WNDWS\VORLAGEN\LLT_1.pot

    Planned Experiments atJLAB FEL

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Motivation

    Industry needs e.g. drillings and microstructures

    more reproducible

    faster production

    higher quality (e.g. melt-free)

    Development

    of anapplication-

    adapted lasersystem

    Solution new laser system

    high-power

    high repetition rate

    ultra-short pulse duration

    Challenge plasma formation

    interaction of laser radiation with plasma

    Use a FEL

    Variation of

    repetition rate

    wave length

    pulse duration

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Related Results & planned Experiments

    Micro-ablation with tailored pulse trains

    Drilling with s-laser radiation

    PLD

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    HOCHSCHULEAACHEN

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    Micro-ablation with tailored pulse trains

    Claudia Hartmann

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Micro-ablation with laser radiation

    aim

    expansion of process limits during micro-ablation of metal (1064 nm)

    less melt on the surface high ablation rates

    use of tailored pulse trains

    interdepartmental cooperation of corecompetence teams of ILT/LLT

    process know-how laser techniques

    system technology modelling and simulation

    state of the art

    micro-ablation with femtosecond -microsecond pulses

    materials: metals and ceramics 2.5 dimensional structures 355 nm - 1064 nm (depending on

    material)

    Used Laser for Project at ILT/LLT

    pulse duration 15 ns to 50 ns burst energy 2 mJ

    pulses per burst 4 pulse distance 0,1 s to 3 s

    b)a) c)

    Ablated structures in:a) Al2O3b) sapphirec) steel

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Process know-how / laser techniques

    Parameter:

    l = 10 HzEB = 2 mJl = 14 ns to 50 nst= 0,1 s to 2s

    purpose

    high ablation rate high ablation quality

    (melt reduction,small Ra, ...)

    ideal ablation parameters

    variation of parameters

    burst and pulse energy number of pulses per burst pulse duration

    pulse distance repetition rate

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    double pulse

    EB = 2 x 1 mJt = 2 s

    triple pulseEB = 3 x 0,66 mJ

    t1 = t2= 2 s

    =250ns =5s =15s

    single pulseE= 2 m J

    1 mm

    tdel tdel tdel

    Process analysis by high speed photography

    Pulse bursts:

    Results

    Plasma of pulse bursts strips of the surface Magnification factor of the plasma volume:

    10 for double pulse, 15 for triple pulse Plasma emission of pulse bursts have larger

    emission times

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    High-speed Microstructuring of Copper, Aluminum and Steel

    verage Power at the Sample Surface, Pt 26 W

    Maximum Average Pulse Peak Intensity, IP 92 MW/cm

    2

    M2- Value (focused beam) 1.6

    Repetition Rate, f 4.1 MHzWavelength at Workpiece 532 nmPulse Duration, p 13 ps

    OscillatorAmplifier

    Frequency

    Conversion BeamDump

    Focusing Optics

    and Scanners

    Sample

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Results

    Top view Top view Cross-section view

    Copper

    Steel

    Aluminium

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Ablation Experiments at FEL

    A: ablation experiments in steel 1.4301 (=304) and C70

    A1: single pulse ablation

    different pulse delays (=rep. Rate.) variation of: - pulse energy

    - pulse overlap- wavelength

    A2: ablation with pulse bursts

    different delays: pulse delay during one burst burst delay

    variation of: - number of pulses per burst (1,2,5, )- burst energy- pulse overlap- wavelength

    High-speed-photography of plasma dynamics

    metallography, SEM and optical microscopy

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    RHEINISCH-

    WESTFLISCHETECHNISCHE

    HOCHSCHULEAACHEN

    U:\PC_WNDWS\VORLAGEN\LLT_1.pot

    Drilling with s-laser radiation

    Lena Trippe

    /

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Drilling at LLT / ILT with laser radiation

    state of the art: single pulse and

    trepan drilling with s-laser-radiation stainless steel, nickel-based

    superalloy cylindrical hole geometry resolidified melt layers 15m aspect ratio 20 : 1 time / hole < 20s (trepan drilling)

    Nd:YAG Slab Laser

    pulse duration: 100-500smax. pulse power: 2kWfocal diameter: 40mM < 2

    aim: expansion of process limits during

    percussion drilling (high speed drilling) metals and ceramics material thickness 5mm aspect ratio > 100 : 1

    time / hole

    1sinterdepartmentalcooperation of corecompetence teams:

    process know-howlaser techniques system technology modelling and

    simulation

    process limits

    understandingof processes

    process diagnostic

    processmonitoring

    processcontrol

    modelling,analysis

    simulation,numerical

    approximation

    1mm

    60m

    single pulse drilling(X5CrNi18-10)

    4mm

    =60, 200m

    trepan drilling

    (CMSX-4)

    Ad t ti f i t

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Adaptation of processing parameters

    < 500nm ablation depth/pulse < 1-5mm< 3mJ pulse energy < 0.1-50J< 1.5mm material thickness < 10mm

    quality

    complete

    removalof material

    geometry

    ...

    productivity

    ablation rate

    ...

    vapourisation

    helicaldrilling

    melting

    percussiondrilling

    10s100ns

    ?

    pulseduration

    P k h / l t h i

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Process know-how / laser techniques

    variation of parameters: pulse energy pulse duration temporal pulse shape focal position repetition rate ...

    development of hole geometryduring one pulse

    single pulse drilling

    Nd:YAG-Slablaserpulse energy: 180mJpulse duration: 200smaterial: X5CrNi18-10

    purposes: reduction of recast layers and

    closures cylindrical geometry of hole

    => parameters for percussiondrilling

    cross-section of single pulse drillings

    Process analysis by high speed photography

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Process analysis by high speed photography

    plasma

    (spikes)

    melt / closure atthe hole entrance

    pulse shape

    200m

    -200 0 200 400 600 800,0

    0,1

    0,2

    0,3

    0,4

    0,5

    0,6

    intensity[a.u.]

    t ime [s]

    single pulse 500s, 500mJ, dt=20shole diameter

    decreasing intensity of

    laser radiation

    Modeling and simulation

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Modeling and simulation

    -30 0 30 60 90 120 150 180 210 2400

    100

    200

    300

    400

    500

    600

    700

    800

    900

    holedepth[m]

    t ime [s]

    experiment

    simulation

    -30 0 30 60 90 120 150 180 210 240-1

    01

    2

    3

    4

    5

    6

    7

    8

    9

    intensity[a.u.]

    t ime [s]

    time scales of physical processes: beginning of melting

    and vapourisation time until meltflow

    becomes stationary

    geometrical scales: hole depth depth where

    resolidification occurs hole diameter

    Drilling experiments at FEL

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Drilling experiments at FEL

    vapour

    plasmaabsorption

    laserradiation

    Analysis of physical processes

    absorption of laser radiation (vapour,plasma) at different wavelengths

    plasma formation and absorption of laserradiation at different pulse numbers anddelays

    development of hole geometrydepending on pulse numbers

    find timescales and geometrical scales incomparison to drilling with s-pulses

    melt

    material

    Drilling experiments at FEL

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Drilling experiments at FEL

    B: drilling experiments (metals (X5CrNi18 10, CMSX-4, Al, Cu),

    ceramics (Si3N4, AlN))B1: single burst drilling

    variation of: - number of pulses (1,2,5,10,20,50,100)- different pulse delays

    - pulse energy- wavelength

    B2: multi-burst drilling variation of: - number of burst (1,2,5,10,20,50,100)

    - number of pulses/burst (1,2,5,10)- different pulse and/or burst delays- pulse energy- wavelength

    High-speed-photography of plasma dynamics

    metallography, SEM and optical microscopy

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    RHEINISCH-

    WESTFLISCHETECHNISCHE

    HOCHSCHULEAACHEN

    U:\PC_WNDWS\VORLAGEN\LLT_1.pot

    Pulsed Laser Deposition

    Leonid Moiseev

    25Pulsed Laser Deposition

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Pulsed Laser Deposition

    Anti reflective coating (ZrO2, Al2O3) onarrays of cylindrical lenses of PMMA

    Ferroelectric thin films (BaTiO3, PZT)

    BaTiO3

    Pt

    Si

    cladding

    electro-opticQ-switch

    Er:BaTiO3

    laser mediumEr:BaTiO3

    substrate

    Q-switch waveguide laser by PLDand microstructuring

    BaTiO3 thin films on Si/Pt

    26Pulsed Laser Deposition

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Pulsed Laser Deposition

    target

    processing gas

    substrate

    Laser radiation

    plasma/vapour

    Plasma expansion during PLD

    27Spectroscopy on laser-induced plasmas

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    LEHRSTUHL FR LASERTECHNIK

    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    p py p

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    29Heat conduction in the target and absorption by the plasma

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    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    0 1 2 3 40

    20

    40

    60

    80

    100

    BaTiO3

    Heat conduction in target

    absorption by plasma

    Pa

    rtitioningo

    fopticalen

    ergyP[%]

    Fluence L[J/cm

    2

    ]

    30Kinetic energy of the particles

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    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Model: Comparison with plume dynamics by iCCD:

    elastic collisions

    T

    prc

    mcE

    L

    i

    ikin

    3

    2

    1

    1+=

    , [1]

    inelastic collisions(macroscopic)

    23

    2

    1

    1

    +

    =

    T

    prc

    mcE

    L

    i

    ikin

    elastic inelasticmaterialc1[eV/u] c1[eV/u]

    c2/MPg

    Al2O3 2,3 0,4 4,1 0,8 6,0 0,5ZrO2 1,2 0,2 1,7 0,3 5,0 0,5BaTiO3 0,9 0,2 1,5 0,3 2,5 0,3

    [1] Gottmann et. al.: (E-MRS 1997)Surf. Coat. Technol. 100-101, (1998) p. 415

    0 1 2 30

    5

    10

    15

    20

    Collision kinetic models c2=16 x 10

    10K/m

    2

    inelastic, v0=18 km/s elastic, v

    0=15 km/s

    ZrO2

    O2, m=32

    L=3 J/cm2

    T=20 C

    2 Pa

    7 Pa10 Pa

    20 Pa

    100 Pa

    Meanvelocity

    [km/s]

    Distance from target R [cm]

    31Ellipsometry: Refractive index of ZrO2 films

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    AACHEN

    2

    5 10 30 100

    1.2

    1.4

    1.6

    1.8

    2.0

    2.2

    2.4

    Zone 3Zone 2Zone 1

    k n

    dS=3,5cm;

    L=3,5J/cm

    2

    dS=2,7cm;

    L=3,5J/cm

    2

    dS=2,7cm; L=5,0J/cm2

    0.00

    0.02

    0.04

    0.06

    0.08

    0.10

    Calculated kinetic energy Zr

    [eV]

    Absorptio

    nindexk(=

    633nm)R

    efrac

    tiveindexn(=633nm)

    TS=20 C

    L=3.5 J/cm2

    The bulk values n=2.2 and k=0

    are achieved at =20 - 50 eV

    32Deposition Experiments at FEL

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    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    C: deposition experiments of oxides and fluorides

    C1: ablation for plasma diagnostics

    optical emission and absorption spectroscopy

    variation of: - different pulse delays

    - pulse energy- wavelength

    C2: pulsed laser deposition with pulse bursts measurement of deposition rate, optical and structural filmproperties and correlation with plasma parameters

    variation of: - number of pulses per burst- burst energy- wavelength

    33Aim of all planned Experiments & Conclusion

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    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Analysis of physical processes ablation

    process efficiency: absorption of laser radiation in vapour/ plasmaat different wavelengths and pulse energies,

    kinetic energy of particles: plasma expansion and absorption oflaser radiation using different pulse numbers, delays and energy

    correlation of the physical processes with the resultingdeposition/ablation rate and film properties

    modelling of the processes using the FEL-parameters

    Find out parameters for

    the deposition of high quality films at high deposition rates (>1 m/s/cm2) the ablation/drilling with tailored pulse trains to precondition the surroundinggetting melt-free structures

    34Aachen and ILT

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    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Rathaus Dom

    Carl der Grosse

    Marktplatz

    ILT&LLT

    35Adaptation of processing parameters

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    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    fs-pulses:

    lower ablation rate high quality

    ms-pulses:

    high ablation rate lower quality

    tpt-project:

    high ablation rate high quality

    36Modeling and simulation

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    RHEINISCH-WESTFLISCHETECHNISCHEHOCHSCHULE

    AACHEN

    Model for ablation process:

    Following pulses againinteract with the surface

    VPB >> VSP, mPB >> mSP drSP/dt< 0, drPB/dt> 0 single pulse: spheric

    discoid

    pulse burst: discoid spheric

    consequence of theprecondition due to the previouspulses