Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and...

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Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara , Mikko Laitinen, Jaakko Julin, Marko Käyhkö, Kai Arstila, Mikko Palosaari, Kimmo Kinnunen, Ilari Maasilta University of Jyväskylä, Finland

Transcript of Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and...

Page 1: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Advanced Ion Beam Analysis for Materials and Thin Film Research

Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö, Kai Arstila, Mikko Palosaari, Kimmo Kinnunen, Ilari Maasilta

University of Jyväskylä, Finland

Page 2: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Outline

n  Particle induced X-ray analysis (PIXE) using transition edge sensors

n  High performance time-of-flight elastic recoil detection analysis (TOF-ERDA)

n  Potential of helium ion microscope in ion beam analysis

Page 3: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

PIXE WITH HIGH-RESOLUTION DETECTORS

Page 4: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

PIXE detectors in use

n  Silicon Drift Detector (SDD)

high-energy X-ray detector low-energy X-ray detector

beam from Pelletron

magnet

He-flow in front of the LE detector

Page 5: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

PIXE detectors in use n  Wavelength dispersive spectrometer (WDS)

WDS of JSI, Slovenia

Knudson et al. Phys. Rev. Lett. 26 (1971) 1149

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Importance of detector development

103

104

105

106

Tuotto

2 3 4 5 6 7 8 9Energia (keV)

Standard silicon drift det.: poor energy resolution, broad energy range

1

10

102

103

104

105

Tuotto

2 3 4 5 6 7 8 9Energia (keV)

Microcalorimeter: Excellent resolution, broad energy range

Wavelength dispersive det.: Excellent resolution, narrow energy range

Ca

Page 7: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

INTRODUCTION to TES Superconducting Transition-Edge Sensor

Page 8: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Transition-Edge Sensor (TES) §  TES as a calorimeter

–  Measures the energy of incident radiation

–  Temperature kept at the transition temperature with negative electrothermal feedback

Schematics of a calorimeter

Typical transition of a TES Normal state

Superconducting state

trans

ition

edg

e

Calorimeter temperature behavior

Page 9: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

TES operation n  In TES there is a superconducting Cu/Mo or Au/Mo layer under the

absorber

n  Operates between superconducting and normal state

n  Extremely sensitive R(T) n  Excellent energy resolution

n  Wide energy range

n  Particles also possible to detect with TES detector

n  Originally FETs were tested for the signal amplification but today superconducting quantum interference devices (SQUIDS) are used to measure the changes in resistance

Typical pulse from a calorimeter

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Single pixel TES n  In 2001 first fully lithographic fabrication process

n  Energy resolution for single pixel device 4.5 eV at 5.9 keV

Hilton et al, IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY,VOL. II, NO. I, MARCH 2001

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Commercial TES for PIXE n  Single pixel device was commercialized under name Polaris by Vericold

Technologies GmbH and some systems were installed, one of them to ITN, Lissbon, for PIXE use in 2008

n  Au absorber volume 100x100x100 µm3

n  Resolution 15 eV at 1.486 keV (Al-Kα) and 24 eV at 10.550 keV (Pb- Lα1)

n  Not any more commercially available

P.C. Chaves et al. NIMB 268 (2010) 2010.

Si/Ta/TbCoFe/Ta

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TES-PIXE SETUP IN JYVÄSKYLÄ

Page 13: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

TES-PIXE setup in Jyväskylä

Page 14: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

TES-PIXE setup in Jyväskylä

n  Cooling by adiabatic demagnetization refrigerator (ADR) n  (Denali Model 102, High Precision

Devices, Inc.)

n  Base temperature of 3 K reached by closed He cycle in 3 days

n  < 50 mK reached by freeing oriented spins of paramagnetic salt pill which sits inside a large superconducting coil

n  Operation in PIXE use about 8 hours at 60 mK

Here the detector is attached

Page 15: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

TES-PIXE setup in Jyväskylä

Page 16: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

~300 µm ~15 mm

Details inside the instrument

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Jyväskylä TES specifications n  160 pixels from NIST, upgradable to 256

n  Total area with 160 pixels 15.6 mm2

n  Single pixel count rate limited to <20 Hz, typical value 10 Hz

n  2.5 µm thick Bi absorber with Mo/Cu superconducting junction

n  Detection efficiency measured with reference samples:

Page 18: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

TES-PIXE MEASUREMENTS From a single pixel to many…

Page 19: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

PIXE-TES results from Jyväskylä PIXE from Mn vs. 55Fe source

Mn Kα from Fe-55 source Best pixel

Instrumental resolution for the best pixel with 55Fe source was 3.06 eV at 5.9 keV

Page 20: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

" Instrumental resolution for the best pixel with 55Fe source was 3.06 eV " For 2 MeV protons and Mn metal sample the resolution was 4.20 eV

PIXE from Mn vs. 55Fe source

Page 21: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

PIXE-TES results from Jyväskylä

•  But, computer interface and I/O cards have all the time had difficulties to handle all pixels simultaneously

•  At the moment maximum is 100+ pixels

Resolution about 5 eV for combined 40 pixels, Improvement reachable by better data analysis

Goal: 160 pixels…

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2 MeV 1H beam

n  Trace elements in glass

NIST SRM-611 reference material

Page 23: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Fly ash from a powerplant

Minimum detection limits of V, Ba, and Ce were decreased by factor of 620, 400, and 680, respectively compared to the SDD.

M. Käyhkö et al, submitted for publication in NIMB

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TES-PIXE with heavy ions

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Titanium compound measurements

2.0 MeV 1H+, 1 hour/sample

Ti Kα

Page 26: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Titanium compound measurements

6.8 MeV 12C3+, ~40 min/sample

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Titanium compound measurements

11.9 MeV 63Cu6+, 1.5 h/sample

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n  All pixels will made operational, then solid angle 32 msr

n  More automated multi-pixel calibration procedures and software will be developed

n  Modification of PIXE setup to be able to measure samples in atmosphere with larger solid angle and polycapillary optics

n  Study the satellite peaks and shifts with different ions and energies. n  Possibility for chemical information over wide energy/elemental

range

In the near future

TES

Page 29: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

HIGH PERFORMANCE ELASTIC RECOIL DETECTION ANALYSIS

Page 30: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Major trends of ERDA today n  2 MeV He beam, absorber and Si detector

n  Simple, poor depth resolution, limited to H isotopes n  Possible also with small single-ended accelerators

n  High energy, heavy ion beam and ΔE-E gas detector n  Mass separation of light elements (Li-Si) possible n  Limited depth resolution due to poor energy resolution n  Detection of hydrogen requires extra Si detector n  Requires large tandem accelerator

n  Heavy ion beam and combined TOF and E telescope n  In principle detection of all elements possible n  Works with both low (3 MeV) and high (>50 MeV) energies n  Instrumentation bit more complicated

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Why ERDA is powerful still today?

n  Light elements have become more and more important (impurities) in thin films and structural materials, difficult to measure

n  Hybrid, especially organic thin films are becoming more common

n  The ERDA performance has developed greatly over the years, especially heavy ion ERDA

n  Even hundreds of accelerators can be potentially used for doing ERDA measurements

The challenge is that there are no commercial instruments available

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Heavy ion ERDA in Jyväskylä n  Pelletron accelerator

n  3 ion sources

n  4 beam lines (TOF-ERDA at 15° beam line)

TES-PIXE

TOF and gas ionization chamber with digitizers for data collection 14 mm

100 nm Si3N4 window Julin, Sajavaara, NIMB 366 (2016) 179.

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ERDA – not only for light elements

n  Heavy ternary oxides for solid oxide fuel cells n  Spinel structured (Mn,Co)3O4 films on Si

n  Measured with 15.3 MeV 63Cu8+ beam

n  With the GIC energy detector Mn, Co and 63Cu nicely separated

H

C

O

Si

Mn Co

63Cu

Mn1.25Co1.75O4 on Crofer 22 APU steel

Page 34: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Would TOF-ERDA work efficiently with even lower energies?

n  2–3 MeV single ended accelerators can produce easily nA currents of Ar2+ (and Ar3+)

n  Or combine implanters with highly charged ions

+ +

=

Pantechnic Nanogan ECRIS

implanter TOF-ERDA telescope

Kobelco accelerator in Tsukuba

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Testing the low-energy concept with our existing setup

n  Measurements with Ar beam simulated by using 39K beam from the 1.7 MV Pelletron in an energy range of 3–8.5 MeV

n  Beam currents were maximum some particle-nA

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Quantitative analysis of hydrogen with low energies ?

n  CVD grown hydrogenated silicon

n  Thickness 210–270 nm

n  Hydrogen concentration 13.9±1.1 at.%

n  Highly resistant against ion irradiation

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n  Measured the sample with 8.5, 6.8, 5.1, 4.0 and 3.0 MeV 39K beam

8.5 MeV

5.1 MeV

3.0 MeV

12

13

14

15

16

2 3 4 5 6 7 8 9

Hyd

roge

n co

ncen

tratio

n (a

t.%)

Beam energy (MeV)

Hydrogen content 100–300e15 at./cm2

H

H

H

Si

Si

Si

O O

O

Quantitative analysis of hydrogen with low energies ?

Page 38: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

n  Measured the sample with 8.5, 6.8, 5.1, 4.0 and 3.0 MeV 39K beam

8.5 MeV

5.1 MeV

3.0 MeV

12

13

14

15

16

2 3 4 5 6 7 8 9

Hyd

roge

n co

ncen

tratio

n (a

t.%)

Beam energy (MeV)

Hydrogen content 100–300e15 at./cm2

this study intercomparison NIMB266

Quantitative analysis of hydrogen with low energies ?

Page 39: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Analysis of Li2CO3 thin films

n  Measurement with 5.1 MeV 39K2+ beam

Time-of-flight

Ene

rgy

H

6Li

7Li

C N

O Cl

Si 39K

H

C

Li

O

N

Si

Page 40: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Time-of-flight

Ene

rgy

H

6Li

7Li C

N O

Cl

Si

39K

H

C

Li

O

N

Si

n  Measurement with 4.0 MeV 39K2+ beam

Analysis of Li2CO3 thin films

Page 41: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Time-of-flight

Ene

rgy

H

6Li

7Li C

N O

Si

39K

H

C

Li

O

N

Si

Analysis of Li2CO3 thin films

n  Measurement with 3.0 MeV 39K2+ beam

Page 42: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Analysis of TiO2 film (heavy element)

n  Analysis of 90 nm thick ALD-TiO2/Si using 13.6 MeV 63Cu and 5.1 MeV 39K beams

9/27/16

13.6 MeV 63Cu 5.1 MeV 39K

H

C O

Si Cl

Ti

Page 43: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

ION BEAM ANALYSIS WITH HELIUM ION MICROSCOPE

Page 44: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Ion tracks in Kapton

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Page 45: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Ion tracks in Kapton

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Page 46: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Ion tracks in Kapton

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Page 47: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

ALD TiO2 deposited at 300 °C

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Page 48: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Conclusions n  Superconductive X-ray detectors open new

possibilities for PIXE, also for structural materials

n  ERDA is still very competitive technique

n  Recent developments have brought TOF-ERDA available for wider range of accelerators and users

n  Helium ion microscopy has great potential for doing very high resolution materials research, including elemental and possibly chemical information

Page 49: Advanced Ion Beam Analysis for Materials and Thin …...Advanced Ion Beam Analysis for Materials and Thin Film Research Timo Sajavaara, Mikko Laitinen, Jaakko Julin, Marko Käyhkö,

Thank you!